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Strain-Induced Effects in Advanced MOSFETs / by Viktor Sverdlov.

Por: Colaborador(es): Tipo de material: TextoTextoSeries Computational MicroelectronicsEditor: Vienna : Springer Vienna : Imprint: Springer, 2011Descripción: xiv, 252 páginas 101 ilustraciones recurso en líneaTipo de contenido:
  • texto
Tipo de medio:
  • computadora
Tipo de portador:
  • recurso en línea
ISBN:
  • 9783709103821
Formatos físicos adicionales: Edición impresa:: Sin títuloClasificación LoC:
  • TK7800-8360
Recursos en línea: Resumen: Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given
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Strain is used to boost performance of MOSFETs. Modeling of strain effects on transport is an important task of modern simulation tools required for device design. The book covers all relevant modeling approaches used to describe strain in silicon. The subband structure in stressed semiconductor films is investigated in devices using analytical k.p and numerical pseudopotential methods. A rigorous overview of transport modeling in strained devices is given

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