Fundamental aspects of plasma chemical physics : kinetics / Mario Capitelli, Roberto Celiberto, Gianpiero Colonna, Fabrizio Esposito, Claudine Gorse, Khaled Hassouni, Annarita Laricchiuta, Savino Longo.
Tipo de material:
TextoSeries Springer Series on Atomic, Optical, and Plasma Physics ; 85Editor: New York, NY : Springer New York : Springer, 2016Edición: 1st ed. 2016Descripción: xvi, 318 páginas : 184 ilustraciones, 138 ilustraciones en colorTipo de contenido: - texto
- computadora
- recurso en línea
- 9781441981851
- QC717.6-718.8
Springer eBooks
Electron-molecule cross sections and rates involving rotationally, vibrationally and electronically excited states -- Reactivity and relaxation of vibrationally/rotationally excited molecules with open shell atoms -- Formation of vibrationally and rotationally excited molecules during atom recombination on surfaces -- Collisional-radiative models for atomic plasmas -- Collisional-radiative models for molecular plasmas -- Kinetic and Monte Carlo approaches to solve Boltzmann equation for the electron energy distribution functions -- Non-equilibrium plasma kinetics under discharge and post-discharge conditions: coupling problems for low pressure and atmospheric cold plasmas -- Ion transport under strong fields -- PIC (Particle In Cell ) models for low-pressure plasmas -- Negative ion H- for fusion -- Non equilibrium plasma expansion through nozzles.
Para consulta fuera de la UANL se requiere clave de acceso remoto.