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020 _a9780387751092
_99780387751092
024 7 _a10.1007/9780387751092
_2doi
035 _avtls000332565
039 9 _a201509030755
_bVLOAD
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040 _aMX-SnUAN
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050 4 _aTA418.7-418.76
100 1 _aPelliccione, Matthew.
_eautor
_9303905
245 1 0 _aEvolution of Thin Film Morphology :
_bModeling and Simulations /
_cby Matthew Pelliccione, Toh-Ming Lu.
264 1 _aNew York, NY :
_bSpringer New York,
_c2008.
300 _axI, 206 páginas
_brecurso en línea.
336 _atexto
_btxt
_2rdacontent
337 _acomputadora
_bc
_2rdamedia
338 _arecurso en línea
_bcr
_2rdacarrier
347 _aarchivo de texto
_bPDF
_2rda
490 0 _aMaterials Science,
_x0933-033X ;
_v108
500 _aSpringer eBooks
505 0 _aDescription of Thin Film Morphology -- Surface Statistics -- Self-Affine Surfaces -- Mounded Surfaces -- Continuum Surface Growth Models -- Stochastic Growth Equations -- Small World Growth Model -- Discrete Surface Growth Models -- Monte Carlo Simulations -- Solid-on-Solid Models -- Ballistic Aggregation Models -- Concluding Remarks.
520 _aThin film deposition is the most ubiquitous and critical of the processes used to manufacture high tech devices. Morphology and microstructure of thin films directly controls their optical, magnetic, and electrical properties. This book focuses on modeling and simulations used in research on the morphological evolution during film growth. The authors emphasize the detailed mathematical formulation of the problem both through numerical calculations based on Langevin continuum equations, and through Monte Carlo simulations based on discrete surface growth models when an analytical formulism is not convenient. Evolution of Thin-Film Morphology will be of benefit to university researchers and industrial scientists working in the areas of semiconductor processing, optical coating, plasma etching, patterning, micro-machining, polishing, tribology, and any discipline that requires an understanding of thin film growth processes. In particular, the reader will be introduced to the mathematical tools that are available to describe such a complex problem, and appreciate the utility of the various modeling methods through numerous example discussions. For beginners in the field, the text is written assuming a minimal background in mathematics and computer programming. The book will enable readers themselves to set up a computational program to investigate specific topics of interest in thin film deposition.
590 _aPara consulta fuera de la UANL se requiere clave de acceso remoto.
700 1 _aLu, Toh-Ming.
_eautor
_9303906
710 2 _aSpringerLink (Servicio en línea)
_9299170
776 0 8 _iEdición impresa:
_z9780387751085
856 4 0 _uhttp://remoto.dgb.uanl.mx/login?url=http://dx.doi.org/10.1007/978-0-387-75109-2
_zConectar a Springer E-Books (Para consulta externa se requiere previa autentificación en Biblioteca Digital UANL)
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