000			03076nam a22003855i 4500
001			297873
003			MX-SnUAN
005			20170705134241.0
007			cr nn 008mamaa
008			150903s2008 gw | o |||| 0|eng d
020			_a9783540766643 _99783540766643
024	7		_a10.1007/9783540766643 _2doi
035			_avtls000351253
039		9	_a201509030421 _bVLOAD _c201405060247 _dVLOAD _y201402171117 _zstaff
040			_aMX-SnUAN _bspa _cMX-SnUAN _erda
050		4	_aTA418.7-418.76
100	1		_aDepla, Diederik. _eeditor. _9333857
245	1	0	_aReactive Sputter Deposition / _cedited by Diederik Depla, Stijn Mahieu.
264		1	_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg, _c2008.
300			_brecurso en línea.
336			_atexto _btxt _2rdacontent
337			_acomputadora _bc _2rdamedia
338			_arecurso en línea _bcr _2rdacarrier
347			_aarchivo de texto _bPDF _2rda
490	0		_aSpringer Series in Materials Science, _x0933-033X ; _v109
500			_aSpringer eBooks
505	0		_aSimulation of the Sputtering Process -- Electron Emission from Surfaces Induced by Slow Ions and Atoms -- Modeling of the Magnetron Discharge -- Modelling of Reactive Sputtering Processes -- Depositing Aluminium Oxide: A Case Study of Reactive Magnetron Sputtering -- Transport of Sputtered Particles Through the Gas Phase -- Energy Deposition at the Substrate in a Magnetron Sputtering System -- Process Diagnostics -- Optical Plasma Diagnostics During Reactive Magnetron Sputtering -- Reactive Magnetron Sputtering of Indium Tin Oxide Thin Films: The Cross-Corner and Cross-Magnetron Effect -- Reactively Sputter-Deposited Solid Electrolytes and Their Applications -- Reactive SputteredWide-Bandgap p-Type Semiconducting Spinel AB2O4 and Delafossite ABO2 Thin Films for “Transparent Electronics” -- Oxide-Based Electrochromic Materials and Devices Prepared by Magnetron Sputtering -- Atomic Assembly of Magnetoresistive Multilayers.
520			_aThe use of thin films is continuously expanding. In the family of Physical Vapour Deposition techniques, sputtering is one of the most important over the past 40 years. In this book, all aspects of the reactive magnetron sputtering process, from the discharge up to the resulting thin film growth, are described in detail, allowing the reader to understand the complete process. Hence, this book gives necessary information for those who want to: - start with reactive magnetron sputtering - understand and investigate the technique - control their sputtering process - tune their existing process, obtaining the desired thin films.
590			_aPara consulta fuera de la UANL se requiere clave de acceso remoto.
700	1		_aMahieu, Stijn. _eeditor. _9333858
710	2		_aSpringerLink (Servicio en línea) _9299170
776	0	8	_iEdición impresa: _z9783540766629
856	4	0	_uhttp://remoto.dgb.uanl.mx/login?url=http://dx.doi.org/10.1007/978-3-540-76664-3 _zConectar a Springer E-Books (Para consulta externa se requiere previa autentificación en Biblioteca Digital UANL)
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999			_c297873 _d297873