000			04470nam a22003975i 4500
001			299269
003			MX-SnUAN
005			20170705134246.0
007			cr nn 008mamaa
008			150903s2010 gw | o |||| 0|eng d
020			_a9783642006234 _99783642006234
024	7		_a10.1007/9783642006234 _2doi
035			_avtls000352920
039		9	_a201509030925 _bVLOAD _c201405060312 _dVLOAD _y201402180931 _zstaff
040			_aMX-SnUAN _bspa _cMX-SnUAN _erda
050		4	_aT174.7
100	1		_aHellborg, Ragnar. _eeditor. _9326323
245	1	0	_aIon Beams in Nanoscience and Technology / _cedited by Ragnar Hellborg, Harry J. Whitlow, Yanwen Zhang.
264		1	_aBerlin, Heidelberg : _bSpringer Berlin Heidelberg, _c2010.
300			_axxiii, 457 p _brecurso en línea.
336			_atexto _btxt _2rdacontent
337			_acomputadora _bc _2rdamedia
338			_arecurso en línea _bcr _2rdacarrier
347			_aarchivo de texto _bPDF _2rda
490	0		_aParticle Acceleration and Detection, _x1611-1052
500			_aSpringer eBooks
505	0		_aTrends in nanoscience and technology -- Nanoscale Engineering in the Biosciences -- High Speed Electronics -- Surface Modification Using Reactive Landing of Mass-Selected Ions -- Basic ion-matter interactions in nanometre scale materials -- Basics of Ion Scattering in Nanoscale Materials -- Box 1: Stopping of Ions in Nanomaterials -- Box 2: Sputtering -- Box 3: Ion Ranges -- Computer Simulation Methods for Defect Configurations and Nanoscale Structures -- Characterising Nanoscale Crystal Perfection by Crystal Mapping -- Box 4: Interatomic Potential -- Ion beam characterisation of nanoscale materials -- Medium Energy Ion Scattering for Near Surface Structure and Depth Profiling -- Box 5: Surface Crystallography Terminology -- Thin Film Characterisation Using MeV Ion Beams -- Nanoscale Materials Defect Characterisation -- Box 6: Nanoscale Defects -- Box 7: Diagnostic Ion Beam Luminescence -- Nanomaterials Science with Radioactive Ion Beams -- Nanoscale materials processing with ion beams -- Nanocluster and Nanovoid Formation by Ion Implantation -- Plasma Etching and Integration with Nanoprocessing -- Focused Ion Beam Machining and Deposition -- Box 8: Sample Preparation for Transmission Electron Microscopy Using a Focused Ion Beam -- Box 9: Integrated Circuit Chip Modification Using Focused Ion Beams -- Proton Beam Writing: A New 3D Nanolithographic Technique -- Box 10: Proton Beam Writing of Optical Structures -- Box 11: Tissue Engineering and Bioscience Methods Using Proton Beam Writing -- Box 12: Stamps for Nanoimprint Lithography -- Box 13: Silicon Micro/Nano-Fabrication Using Proton Beam Writing and Electrochemical Etching -- Nanoscale Materials Modification for Device Applications -- Luminescence, Ion Implantation, and Nanoparticles -- Micro- and Nanoengineering with Ion Tracks -- Equipment and practice -- Ion Accelerators for Nanoscience -- Focusing keV and MeV Ion Beams -- Ion Spectrometers and Detectors -- Electronics for Application of Ion Beams in Nanoscience.
520			_aEnergetic ion beam irradiation is the basis of a wide plethora of powerful research- and fabrication-techniques for materials characterisation and processing on a nanometre scale. Materials with tailored optical, magnetic and electrical properties can be fabricated by synthesis of nanocrystals by ion implanation, focused ion beams can be used to machine away and deposit material on a scale of nanometres and the scattering of energetic ions is a unique and quantitative tool for process development in high speed electronics and 3-D nanostructures with extreme aspect radios for tissue engineering and nano-fluidics lab-on-a-chip may be machined using proton beams. This book will benefit practitioners, researchers and graduate students working in the field of ion beams and application and more generally everyone concerned with the broad field of nanoscience and technology.
590			_aPara consulta fuera de la UANL se requiere clave de acceso remoto.
700	1		_aWhitlow, Harry J. _eeditor. _9336118
700	1		_aZhang, Yanwen. _eeditor. _9336119
710	2		_aSpringerLink (Servicio en línea) _9299170
776	0	8	_iEdición impresa: _z9783642006227
856	4	0	_uhttp://remoto.dgb.uanl.mx/login?url=http://dx.doi.org/10.1007/978-3-642-00623-4 _zConectar a Springer E-Books (Para consulta externa se requiere previa autentificación en Biblioteca Digital UANL)
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999			_c299269 _d299269