TEST - Catálogo BURRF
   

TRANSISTOR LEVEL MODELING FOR ANALOG/RF IC DESIGN / edited by WLADYSLAW GRABINSKI, BART NAUWELAERS, DOMINIQUE SCHREURS.

Por: Colaborador(es): Tipo de material: TextoTextoEditor: Dordrecht : Springer Netherlands, 2006Descripción: xiii, 293 páginas recurso en líneaTipo de contenido:
  • texto
Tipo de medio:
  • computadora
Tipo de portador:
  • recurso en línea
ISBN:
  • 9781402045561
Formatos físicos adicionales: Edición impresa:: Sin títuloClasificación LoC:
  • TK7888.4
Recursos en línea:
Contenidos:
2/3-D process and device simulation. An effective tool for better understanding of internal behavior of semiconductor structures -- PSP: An advanced surface-potential-based MOSFET model -- EKV3.0: An advanced charge based MOS transistor model.A design-oriented MOS transistor compact model -- Modelling using high-frequency measurements -- Empirical FET models -- Modeling the SOI MOSFET nonlinearities. An empirical approach -- Circuit level RF modeling and design -- On incorporating parasitic quantum effects in classical circuit simulations -- Compact modeling of the MOSFET in VHDL-AMS -- Compact modeling in Verilog-A.
Resumen: The editors and authors present a wealth of knowledge regarding the most relevant aspects in the field of MOS transistor modeling. The first chapter lays out the 2/3D process and device simulations as an effective tool for a better understanding of the internal behavior of semiconductor structures and this with a focus on high-voltage MOSFET devices. Subsequently, the mainstream developments of both the PSP and the EKV models are discussed in detail. These physics-based MOSFET models are compared to the measurement-based models which are frequently used in RF applications. The comparison includes an overview of the relevant empirical models and measurement techniques. The following chapters include SOI-specific aspects, modeling enhancement of small geometry MOSFET devices and a survey of quantum effects in devices and circuits. Finally, an explanation of hardware description languages such as VHDL-AMS and Verilog-A is offered and shows the possibilities of the practical implementation and standardization of the different modeling methodologies found in the preceding chapters. The variety of subjects and the high quality of content of this volume make it a reference document for researchers and users of MOSFET devices and models. The book can be recommended to everyone who is involved in compact model developments, numerical TCAD modeling, parameter extraction, space-level simulation or model standardization. The book will appeal equally to PhD students who want to understand the ins and outs of MOSFETs as well as to modeling designers working in the analog and high-frequency areas.
Valoración
    Valoración media: 0.0 (0 votos)
No hay ítems correspondientes a este registro

Springer eBooks

2/3-D process and device simulation. An effective tool for better understanding of internal behavior of semiconductor structures -- PSP: An advanced surface-potential-based MOSFET model -- EKV3.0: An advanced charge based MOS transistor model.A design-oriented MOS transistor compact model -- Modelling using high-frequency measurements -- Empirical FET models -- Modeling the SOI MOSFET nonlinearities. An empirical approach -- Circuit level RF modeling and design -- On incorporating parasitic quantum effects in classical circuit simulations -- Compact modeling of the MOSFET in VHDL-AMS -- Compact modeling in Verilog-A.

The editors and authors present a wealth of knowledge regarding the most relevant aspects in the field of MOS transistor modeling. The first chapter lays out the 2/3D process and device simulations as an effective tool for a better understanding of the internal behavior of semiconductor structures and this with a focus on high-voltage MOSFET devices. Subsequently, the mainstream developments of both the PSP and the EKV models are discussed in detail. These physics-based MOSFET models are compared to the measurement-based models which are frequently used in RF applications. The comparison includes an overview of the relevant empirical models and measurement techniques. The following chapters include SOI-specific aspects, modeling enhancement of small geometry MOSFET devices and a survey of quantum effects in devices and circuits. Finally, an explanation of hardware description languages such as VHDL-AMS and Verilog-A is offered and shows the possibilities of the practical implementation and standardization of the different modeling methodologies found in the preceding chapters. The variety of subjects and the high quality of content of this volume make it a reference document for researchers and users of MOSFET devices and models. The book can be recommended to everyone who is involved in compact model developments, numerical TCAD modeling, parameter extraction, space-level simulation or model standardization. The book will appeal equally to PhD students who want to understand the ins and outs of MOSFETs as well as to modeling designers working in the analog and high-frequency areas.

Para consulta fuera de la UANL se requiere clave de acceso remoto.

Universidad Autónoma de Nuevo León
Secretaría de Extensión y Cultura - Dirección de Bibliotecas @
Soportado en Koha